Tuesday, December 06, 2016

Study of a Vanadium Precursor for VO2 Thin-Film Growth in the Atomic Layer Deposition Process by Multiscale Simulations

TOC Graphic

The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.6b06347


from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) http://ift.tt/2g7OBu9
via IFTTT
Posted by at

No comments:

Post a Comment

Subscribe to: Post Comments (Atom)