Monday, October 17, 2016

Toward Selective Ultra-High-Vacuum Atomic Layer Deposition of Metal Oxides on Si(100)

TOC Graphic

The Journal of Physical Chemistry C
DOI: 10.1021/acs.jpcc.6b08130


from The Journal of Physical Chemistry C: Latest Articles (ACS Publications) http://ift.tt/2diT6FO
via IFTTT
Posted by at

No comments:

Post a Comment

Subscribe to: Post Comments (Atom)