Nanoscale, 2015, Accepted Manuscript
DOI: 10.1039/C5NR04264J, Paper
DOI: 10.1039/C5NR04264J, Paper
Enrico Brinciotti, Georg Gramse, Soeren Hommel, Thomas Schweinboeck, Andreas Altes, Matthias Fenner, Juergen Smoliner, Manuel Kasper, Giorgio Badino, Silviu Sorin Tuca, Ferry Kienberger
We present a new method to extract resistivity and doping concentration of semiconductor materials from Scanning Microwave Microscopy (SMM) S11 reflection measurements. Using a three error parameters de-embedding workflow, the...
The content of this RSS Feed (c) The Royal Society of Chemistry
We present a new method to extract resistivity and doping concentration of semiconductor materials from Scanning Microwave Microscopy (SMM) S11 reflection measurements. Using a three error parameters de-embedding workflow, the...
The content of this RSS Feed (c) The Royal Society of Chemistry
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