Nucleation and Growth of the HfO2 Dielectric Layer for Graphene-Based Devices

Chemistry of Materials

DOI: 10.1021/acs.chemmater.5b01226

Il-Kwon Oh, Jukka Tanskanen, Hanearl Jung, Kangsik Kim, Mi Jin Lee, Zonghoon Lee, Seoung-Ki Lee, Jong-Hyun Ahn, Chang Wan Lee, Kwanpyo Kim, Hyungjun Kim and Han-Bo-Ram Lee
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