Thursday, August 20, 2015

Effects of length dispersity and film fabrication on the sheet resistance of copper nanowire transparent conductors

Nanoscale, 2015, 7,14496-14504
DOI: 10.1039/C5NR03671B, Paper
James W. Borchert, Ian E. Stewart, Shengrong Ye, Aaron R. Rathmell, Benjamin J. Wiley, Karen I. Winey
A combination of Rutherford Backscattering Spectrometry and Monte Carlo simulations were used to characterize the effect of post-treatment methods, area coverage and length distribution on the performance of copper nanowire-based transparent conductors.
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