Wafer-scale synthesis of thickness-controllable MoS2 films via solution-processing using a dimethylformamide/n-butylamine/2-aminoethanol solvent system

Nanoscale, 2015, 7,9311-9319
DOI: 10.1039/C5NR01486G, Paper

Jaehyun Yang, Yeahyun Gu, Eunha Lee, Hyangsook Lee, Sang Han Park, Mann-Ho Cho, Yong Ho Kim, Yong-Hoon Kim, Hyoungsub Kim
Highly thickness controllable growth of uniform MoS₂ thin films on the wafer-scale via a spin-coating route.
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