Nanoscale, 2015, Accepted Manuscript
DOI: 10.1039/C5NR02328A, Paper
DOI: 10.1039/C5NR02328A, Paper
Guangzhu Ding, Chao Li, xiaohui li, yangjiang wu, Yaowen Li, jie ping liu, Zhijun Hu, Yongfang Li
We develop a solvent-assistant room temperature nanoimprint lithography (SART-NIL) technique to fabricate ideal active layer consisting of poly(3-hexylthiophene) nanopillar arrays surrounded by [6,6]-phenyl-C61-butyric acid methyl ester. Characterization of scanning electron...
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We develop a solvent-assistant room temperature nanoimprint lithography (SART-NIL) technique to fabricate ideal active layer consisting of poly(3-hexylthiophene) nanopillar arrays surrounded by [6,6]-phenyl-C61-butyric acid methyl ester. Characterization of scanning electron...
The content of this RSS Feed (c) The Royal Society of Chemistry
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