Nanoscale Buckling of Ultrathin Low-k Dielectric Lines during Hard-Mask Patterning

Nano Letters

DOI: 10.1021/acs.nanolett.5b00685

Gheorghe Stan, Cristian V. Ciobanu, Igor Levin, Hui J. Yoo, Alan Myers, Kanwal Singh, Christopher Jezewski, Barbara Miner and Sean W. King
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