Nanoscale , 2015, Advance Article
DOI: 10.1039/C4NR07420C, Paper
DOI: 10.1039/C4NR07420C, Paper
N. Mojarad, M. Hojeij, L. Wang, J. Gobrecht, Y. Ekinci
Using extreme ultraviolet interference lithography, we demonstrate patterning of different inorganic photoresists, reaching the highest reported photolithography resolution of 7 nm half-pitch.
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Using extreme ultraviolet interference lithography, we demonstrate patterning of different inorganic photoresists, reaching the highest reported photolithography resolution of 7 nm half-pitch.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
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