Thursday, February 05, 2015

Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond




Nanoscale , 2015, Advance Article

DOI: 10.1039/C4NR07420C, Paper

N. Mojarad, M. Hojeij, L. Wang, J. Gobrecht, Y. Ekinci

Using extreme ultraviolet interference lithography, we demonstrate patterning of different inorganic photoresists, reaching the highest reported photolithography resolution of 7 nm half-pitch.

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