Nanoscale , 2015, Accepted Manuscript
DOI: 10.1039/C4NR06329E, Paper
DOI: 10.1039/C4NR06329E, Paper
Daniel Ratchford, Junghoon Yeom, James P. Long, Pehr Pehrsson
Metal-assisted chemical etching (MACE) offers an inexpensive, massively parallel fabrication process for producing silicon nanowires (SiNWs). These nanowires can possess a degree of porosity depending on etch conditions. Because the...
The content of this RSS Feed (c) The Royal Society of Chemistry
Metal-assisted chemical etching (MACE) offers an inexpensive, massively parallel fabrication process for producing silicon nanowires (SiNWs). These nanowires can possess a degree of porosity depending on etch conditions. Because the...
The content of this RSS Feed (c) The Royal Society of Chemistry
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