Monday, January 26, 2015

Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond

Nanoscale , 2015, Accepted Manuscript

DOI: 10.1039/C4NR07420C, Paper

Nassir Mojarad, Mohamad Hojeij, Li Wang, Jens Gobrecht, Yasin Ekinci

All nanofabrication methods come with an intrinsic resolution limit, set by their governing physical principles and instrumentation. In the case of extreme ultraviolet (EUV) lithography at 13.5 nm wavelength, this...

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