Thursday, January 08, 2015

Atomic Layer Deposition of AlF3 Thin Films Using Halide Precursors

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Chemistry of Materials

DOI: 10.1021/cm504238f




Miia Mäntymäki, Mikko J. Heikkilä, Esa Puukilainen, Kenichiro Mizohata, Benoît Marchand, Jyrki Räisänen, Mikko Ritala and Markku Leskelä

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