Nanoscale , 2015, Advance Article
DOI: 10.1039/C4NR04532G, Paper
DOI: 10.1039/C4NR04532G, Paper
Jaeho Jeon, Sung Kyu Jang, Su Min Jeon, Gwangwe Yoo, Yun Hee Jang, Jin-Hong Park, Sungjoo Lee
We demonstrate that layer-controlled and large-area CVD MoS2 films can be achieved by treating the surfaces of their bottom SiO2 substrates with the oxygen plasma process.
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We demonstrate that layer-controlled and large-area CVD MoS2 films can be achieved by treating the surfaces of their bottom SiO2 substrates with the oxygen plasma process.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
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