Tuesday, November 11, 2014

Layer-controlled CVD growth of large-area two-dimensional MoS2 films




Nanoscale , 2015, Advance Article

DOI: 10.1039/C4NR04532G, Paper

Jaeho Jeon, Sung Kyu Jang, Su Min Jeon, Gwangwe Yoo, Yun Hee Jang, Jin-Hong Park, Sungjoo Lee

We demonstrate that layer-controlled and large-area CVD MoS2 films can be achieved by treating the surfaces of their bottom SiO2 substrates with the oxygen plasma process.

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