Friday, October 10, 2014

Role of Interfacial Aluminum Silicate and Silicon as Barrier Layers for Atomic Layer Deposition of Al2O3 Films on Chemically Cleaned InP(100) Surfaces

TOC Graphic


The Journal of Physical Chemistry C

DOI: 10.1021/jp5052084




Wilfredo Cabrera, Mathew D. Halls, Ian M. Povey and Yves J. Chabal

Click for full article
Posted by at
Labels: ,

No comments:

Post a Comment

Subscribe to: Post Comments (Atom)