Monday, October 13, 2014

Atomic layer deposition-based tuning of the pore size in mesoporous thin films studied by in situ grazing incidence small angle x-ray scattering

Nanoscale , 2014, Accepted Manuscript

DOI: 10.1039/C4NR05049E, Paper

Jolien Dendooven, Kilian Devloo-Casier, Matthias Ide, Kathryn Grandfield, Mert Kurttepeli, Karl Ludwig, Sara Bals, Pascal Van Der Voort, Christophe Detavernier

Atomic layer deposition (ALD) enables the conformal coating of porous materials, making the technique suitable for pore size tuning at the atomic level, e.g., for applications in catalysis, gas separation...

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