Nanoscale , 2014, Accepted Manuscript
DOI: 10.1039/C4NR04228J, Paper
DOI: 10.1039/C4NR04228J, Paper
Chung-Che Huang, Feras Al-Saab, Yudong Wang, Jun-Yu Ou, John C. Walker, Shun Cai Wang, Behrad Gholipour, Robert E Simpson, Dan Hewak
Nano-scale MoS2 thin films are successfully deposited on a variety of substrates by atmospheric pressure chemical vapor deposition (APCVD) at ambient temperature, followed by a two-step annealing process. These annealed...
The content of this RSS Feed (c) The Royal Society of Chemistry
Nano-scale MoS2 thin films are successfully deposited on a variety of substrates by atmospheric pressure chemical vapor deposition (APCVD) at ambient temperature, followed by a two-step annealing process. These annealed...
The content of this RSS Feed (c) The Royal Society of Chemistry
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