Etching-free patterning method for electrical characterization of atomically thin MoSe2 films grown by chemical vapor deposition

Nanoscale , 2014, Advance Article

DOI: 10.1039/C4NR03817G, Communication

M. Iqbal Bakti Utama, Xin Lu, Da Zhan, Son Tung Ha, Yanwen Yuan, Zexiang Shen, Qihua Xiong

Sample patterning with SU-8 allows reduction of leakage current and electrical transport characterizations from atomically-thin MoSe₂ film devices.

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