Nanoscale , 2014, Advance Article
DOI: 10.1039/C4NR01954G, Review Article
DOI: 10.1039/C4NR01954G, Review Article
A. J. M. Mackus, A. A. Bol, W. M. M. Kessels
This article reviews the patterning of films deposited by atomic layer deposition (ALD), as well as the use of ALD as an enabling technology in advanced nanopatterning schemes.
To cite this article before page numbers are assigned, use the DOI form of citation above.
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This article reviews the patterning of films deposited by atomic layer deposition (ALD), as well as the use of ALD as an enabling technology in advanced nanopatterning schemes.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
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