Nanoscale , 2014, Advance Article
DOI: 10.1039/C4NR01874E, Paper
DOI: 10.1039/C4NR01874E, Paper
Yuan-Ming Chang, Srikanth Ravipati, Pin-Hsu Kao, Jiann Shieh, Fu-Hsiang Ko, Jenh-Yih Juang
Superior broadband (350-1500 nm) antireflective performance is obtained in the TiN/Si-nanopillar heterostructure fabricated by the one-step self-masking dry etching method.
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Superior broadband (350-1500 nm) antireflective performance is obtained in the TiN/Si-nanopillar heterostructure fabricated by the one-step self-masking dry etching method.
To cite this article before page numbers are assigned, use the DOI form of citation above.
The content of this RSS Feed (c) The Royal Society of Chemistry
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