Nanoscale , 2014, Accepted Manuscript
DOI: 10.1039/C4NR02451F, Paper
DOI: 10.1039/C4NR02451F, Paper
Kian Ping Loh, Lee Kheng Tan, Bo Liu, Jinghua Teng, Shifeng Guo, Hong Yee Low
Mono- to multilayer thick MoS2 film has been grown by atomic layer deposition (ALD) technique at 300 [o]C on sapphire wafer. ALD provides precise control of MoS2 film thickness due...
The content of this RSS Feed (c) The Royal Society of Chemistry
Mono- to multilayer thick MoS2 film has been grown by atomic layer deposition (ALD) technique at 300 [o]C on sapphire wafer. ALD provides precise control of MoS2 film thickness due...
The content of this RSS Feed (c) The Royal Society of Chemistry
Click for full article
No comments:
Post a Comment