Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication

ACS Nano

DOI: 10.1021/nn501300b

Hsinyu Tsai, Jed W. Pitera, Hiroyuki Miyazoe, Sarunya Bangsaruntip, Sebastian U. Engelmann, Chi-Chun Liu, Joy Y. Cheng, James J. Bucchignano, David P. Klaus, Eric A. Joseph, Daniel P. Sanders, Matthew E. Colburn and Michael A. Guillorn

Click for full article