The crystal orientation relation and macroscopic surface roughness in hetero-epitaxial graphene grown on Cu/mica

Clean, flat and orientation-identified graphene on a substrate is in high demand for graphene electronics. In this study, the hetero-epitaxial graphene growth on Cu(111)/mica(001) by chemical vapor deposition is investigated to check the applicability for top-gate insulator research on graphene, as well as graphene channel research, by transferring graphene on to SiO 2 /Si substrates. After adjusting the graphene growth conditions, the surface roughness of the graphene/Cu/mica substrate and the average smoothed areas are ∼0.34 nm and ∼100 μ m 2 , respectively. The orientation of graphene in the graphene/Cu/mica substrate can be identified by the hexagonal void morphology of Cu. Moreover, we demonstrate a relatively high mobility of ∼4500 cm 2 V −1 s −1 in graphene transferred on the SiO 2 /Si substrate. These results suggest that the present graphene/Cu/mica substrate can be used for top-gate insulator research on gra...

J L Qi, K Nagashio, T Nishimura and A Toriumi

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