Monday, April 14, 2014

Atomic Layer Deposition of High-Purity Palladium Films from Pd(hfac)2 and H2 and O2 Plasmas

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The Journal of Physical Chemistry C

DOI: 10.1021/jp5009412




Matthieu J. Weber, Adriaan J. M. Mackus, Marcel A. Verheijen, Valentino Longo, Ageeth A. Bol and Wilhelmus M. M. Kessels

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